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UM10-45U
UM10-45U - Ø1" Low GDD Ultrafast Mirror, 355 - 445 nm, 45° AOI
Descripción
Low GDD Ultrafast Mirrors for 355 - 455 nm
Caracteristicas
- Diseñado para los de doble frecuencia ultrarápido Ti: Zafiro láser Pulsos
- Ideal para pulsos de láser más corto de 100 fs
- Reflectancia mayor que 99%
- Bajo retardo de grupo de la dispersión: <| 30 FS2 |
- Disponible en tamaños de Ø 1/2 "y" Ø1
- Para uso en un ángulo de incidencia de 45 °
| Item # | UM05-45U | UM10-45U |
|---|---|---|
| Diameter | 1/2" | 1" |
| Diameter Tolerance | +0.0 mm / -0.1 mm | |
| Thickness | 6.3 mm (0.25") | 9.5 mm (0.37") |
| Thickness Tolerance | ±0.2 mm | |
| Clear Aperture | >80% of Diameter | |
| Angle of Incidence | 45° | |
| Reflectance (Absolute) | Rs > 99% (355 - 445 nm) Rp > 99% (370 - 425 nm) |
|
| Group Delay Dispersion | <|30 fs2| (S-Polarization: 355 - 445 nm) (P-Polarization: 370 - 425 nm) |
|
| Laser Induced Damage Thresholda |
0.081 J/cm2 (400 nm, 55 fs FWHM, S-Pol, 1 Pulse) 0.062 J/cm2 (400 nm, 55 fs FWHM, S-Pol, 10000 Pulses) |
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| Front Surface Flatness | λ/10 at 632.8 nm Over Clear Aperture | |
| Front Surface Quality | 10-5 Scratch-Dig | |
| Back Surface Flatness | λ/2 at 632.8 nm Over Clear Aperture | |
| Back Surface Quality | 40-20 Scratch-Dig | |
| Parallelism | ||
| Substrate | Fused Silica | |
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